Daniel M. Dobkin

Fundamentals of Chemical Vapor Deposition

 

Plasmas for CVD

Survey of Plasmas and Methods of Excitation

Introduction
Capacitive Plasmas
Capacitive Plasma Parameters
Other Discharge Types: Magnetron, ECR, Inductive, Microwave

Implications for CVD

Plasmas for Deposition
Plasma Damage

Some Technical Details

 

Ambipolar Diffusion
Ion Flux and the Bohm Velocity

 

A bibliographical note: while numerous books on various aspects of plasmas exist, the best one I'm aware of for people in the semiconductor and materials processing industries is Principles of Plasma Discharges and Materials Processing, by Michael Lieberman and Allan Lichtenberg, Wiley 1994, ISBN 0-471-00577-0. If you're looking for something shorter, the next choice [a bit dated] is Dry Etching for VLSI, by A. van Roosmalen, J. Baggerman and S. Brader, Plenum 1991, ISBN 0-306-43835-6.

prevarrow

Table of Contents

nextarrow

BOOK VERSION OF THE CVD TUTORIAL

Go Home