| Daniel M. Dobkin |
|
|
This tutorial seeks to provide an introduction to the underlying principles of chemical vapor deposition of films, with examples of films, reactors, and applications. The emphasis is on microelectronic applications of these techniques, but the fundamentals of transport, chemistry, and plasma generation are of course applicable in many circumstances.
The tutorial assumes a general background roughly equivalent to a BS degree in the physical sciences. The aspects of thermodynamics, statistical mechanics, chemistry, and electromagnetism needed for understanding CVD processes are reviewed here, but only in sufficient depth to remind the reader of a past acquaintance with the topics, as in e.g. a college-level course. Some knowledge of the basics of semiconductor manufacturing is also helpful in following the discussion of films and applications.
| Table of Contents |
|
BOOK VERSION : click on the link below. For more details go here first.
This work is licensed under a Creative
Commons License.
Traffic on this site has been up in 2004, due presumably to the recovery in the semiconductor / equipment business: it appears that over 100 visitors/day make use of the site on weekdays. I hope these materials are useful; please contact me with questions or comments. --Dan Dobkin 10/6/04
|
|
