| Daniel M. Dobkin |
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BOOK VERSION : The book version of this web site tutorial, "Principles of Chemical Vapor Deposition", by Daniel M. Dobkin and Michael K. Zuraw, published by Kluwer Academic, is available from Amazon. Click on the link or the picture below, or search on Amazon (www.amazon.com) for e.g. 'Dobkin chemical' if the link doesn't work.
The book has most of the content of the web site. In addition, each of the fundamentals chapters contains an extended example section in which the principles discussed are applied to a showerhead and tube reactor. The two applications chapters also provide fairly extensive 'further reading' lists. The table of contents is reproduced below. We hope you will find the book useful and handy. It is a very nice high-quality printing, though the cover is quite dull, and erroneously treats us as editors rather than authors. Thanks for your consideration.
Acknowledgements vii
Introduction
1. What's Behind the Facade?
2. Generic Reactors and Process Considerations
3. Tube and Showerhead Reactor Examples
Reactors Without Transport 9
1. What Goes In Must Go Somewhere: Measuring Gases
2. Review: Kinetic Theory
3. The Zero-dimensional Reactor
4. Zero-dimensional Tube and Showerhead Examples
Mass Transport 27
1. Introduction to transport
2. Convection and Diffusion
3. Diffusion: Physics and Math
4. Fluid Flow and Convective Transport
5. When Flows Matter: the Knudsen Number
6. Tube and Showerhead Examples
7. On to Phonons
Heat Transport 69
1. What is Heat (Energy) Transport?
2. Heat Conduction and Diffusion
3. Convective Heat Transfer Made (very) Simple
4. Natural Convection
5. Radiative Heat Transfer
6. Temperature Measurement
7. Tube and Showerhead Examples
Chemistry for CVD 95
1. What does the "C" Stand For Anyway?
2. Volatility: The "V" in CVD
3. Equilibrium: Where things Are Going (but not how fast they
get there)
4. Kinetics: The Slowest Step Wins
5. Real Precursors for Real films
6. Tube Reactor Example
7. A Few Final Remarks
Gas Discharge Plasmas For CVD 149
1. Plasma Discharges: An Instant Review
2. The Low-Pressure Cold-Plasma State
3. Key Parameters For Capacitive Plasma Behavior
4. Alternative Excitation Methods
5. Plasmas for Deposition
6. Plasma Damage
7. Technical Details
8. ONGOING EXAMPLE: Parallel Plate Plasma Reactor
9. A Remark on Computational Tools
CVD Films 195
1. Why CVD?
2. Silicon dioxide
3. Silicon Nitride
4. Tantalum Pentoxide
5. Metal Deposition by CVD
6. Concluding Remarks
CVD Reactors 247
1. CVD Reactor configurations
2. Tube reactors
3. Showerhead Reactors
4. High Density Plasma Reactors
5. Injector-based Atmospheric Pressure Reactors
6. Reactor Conclusions
Index 269
Daniel M. Dobkin
enigmatics@batnet.com
